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Andreas Erdmann: The 2026 SPIE Frits Zernike Award for Microlithography

For contributions to the understanding and modeling of image formation and resist patterning in deep and #EUVL, especially photomask's 3D effects, and for #lithography education.

spie.org/news/andreas...

[PROGRESS REVIEW]
Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications
2023 Jpn. J. Appl. Phys. 62 SG0812

iopscience.iop.org/article/10.3...

#JJAP
#physics
#Openaccess
#Deposition
#Infiltration
#Atom
#resists
#Molecular
#ultraviolet
#lithography
#EUVL

Advertisement for SPIE Advanced Lithography Patterning event featuring a close-up image of a microchip with text overlay: 'Call for Papers. Abstracts due 10 September.'

Calling all researchers in optical and EUV lithography: the SPIE Advanced Lithography + Patterning 2026 call for papers is open now, with abstracts due 10 September!

Share your research at this leading #semiconductor conference in San Jose: spie.org/conferences...

#EUVL #SPIELitho

At #SPIElitho, Shien-Yang Wu of TSMC outlined the urgent need for energy-efficient computing as AI drives exponential power demands. Innovations in 3D-stacked transistors and #EUVL optimization are helping, but further breakthroughs are needed.

Read more here: spie.org/news/meetin...