✨ Read ICM Paper on EUV #photoresists!
Tin-oxo clusters (TOCs) are explored as promising candidates for next-generation extreme ultraviolet (EUV) photoresist materials due to their strong EUV absorption properties and small molecular sizes.
🔗 doi.org/10.1039/D5IM...
Global Photoresists Market Expected to Surpass USD 9.88 Billion by 2031, Driven by Advancements in Semiconductors and AI #India #AI_Technology #Bangalore #Semiconductor #Photoresists
Latest day job thing. #EUV #photoresists semiengineering.com/many-options...
In terms of relevance for the supply chain, Japan is a very important country - just check for TEL in this document (and potential Chinese firms per sector).
Check also page 59 which relates to #photoresists @bloomberg.com
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cset.georgetown.edu/wp-content/u...
A new Cluster publication with Young Scientist @FlorianFeist1 & PI @BarnerKowollik provides critical insights to #design criteria for #photoresists in 3D light sheet printing that requires dual colour activation: https://doi.org/10.1002/ange.202307535 👏🎨 #chromophores #polymers...