a Qubit heterostructure schematic. The inset dashed rectangle depicts alloy and roughness disorder near interfaces. b An energy, E, diagram indicating that a quantum well forms in the s-Si layer owing to conduction band edge offset from adjacent SiGe layers, and the confinement potential width, w, is shaped by growth roughness and intermixing length, L. Generally, interface roughness is not strictly correlated between interfaces and intermixing may be superposed to yield c complex 3D interface structures that are intractable for d the highest spatial resolution post-growth measurement techniques, such as transmission electron microscopy (TEM) and APT owing to, e.g., limited practical measurement volumes smaller than established roughness correlation lengths, along with probe convolution effects, e.g., averaging of structure information along the TEM beam path through a cross-sectional slice. Here, 4τ denotes the observed interface width including various disorder contributions. Image and caption from https://doi.org/10.1038/s41534-024-00827-8
🧪 ⚛️ neat result from Sandia/CINT and EAG using multiscale, multiperspective STM, MBE, and STEM to study interfacial disorder at Si/SiGe quantum well interfaces to predict, with effective mass theory, confinement potential variation for semiconductor qubits doi.org/10.1038/s415... #SurfSci