The #ALDALE2026 schedule 🚀 has launched & there are some 🔥talks – checkout the plenary, invited, innovator, oral, and poster talks + the awards finalists, sponsors, & exhibitors. Want to present it’s not too late - submit by ⏳ April 9. Early registration ends May 1.
ald2026.avs.org #ALDep #ALEtch

Atomic layer deposition meme. In the first panel, the ligands say "This is my surface". In the second panel, they are run over by the next ALD cycle.

Just in time for #pi day -- an anonymous participant of the #ChemPrint winter school came up with a very special #nerd joke: Probably the world's first atomic layer deposition (ALD) #meme!

#ALDep #chemsky #materialssky #surface @fau.de

Dr. Syeda Tasnia Sameen holding a bouquet of flowers

Dr. Syeda Tasnia Sameen and her dissertation committee

#PhDfinished! Dr. Syeda Tasnia Sameen successfully defended her dissertation: "Designing Volatile Organometallic Complexes in the +3 Oxidation State: From Atomic Layer Deposition to Lanthanide Isotope Enrichment” at #wsuchemistry. Congratulations! #chemistryindetroit #AlDep #ChemSky

Carbon-supported, size-tunable Ni nanoparticles by atomic layer deposition Uniform nickel nanoparticles (Ni NPs) on carbon black were synthesized by fluidized-bed reactor atomic layer deposition (FBR-ALD). ALD behavior was first establ

The scalable synthesis of size-tunable Ni nanoparticles on carbon black w/ fluidized-bed #ALDep method advances non-noble metal Ni/C catalysts toward device-relevant H electrocatalysis & bridges ALD model systems w/ realistic catalyst architectures.

doi.org/10.1116/6.00...

Physical approach to enhance the selectivity of SiO2 area-selective deposition using substrate biasing Area-selective atomic layer deposition (AS-ALD) can provide a solution to current bottlenecks associated with traditional lithography-based patterning in the do

Area-selective #ALDep is enhanced using a physical approach: ion sputter-etching. Authors from @tue.nl show that well-controlled ions suppress unwanted nucleation & strongly improve selectivity without chemical etchants.
doi.org/10.1116/6.00...

Flier for a PhD defense

The Final Public Oral Defense for the Degree of Doctor of Philosophy from Syeda Tasnia Sameen will be held on Friday, March 6th, 1:00 pm, Schaap Hall, Chemistry, Wayne State University. Good Luck! #wsuchemistry #AlDep #PhDdefense #ChemSky

Role of idealized surface representations in computational area-selective atomic layer deposition: Assessing trimethoxypropylsilane blocking performance for Al2O3 deposition with crystalline SiO2 Area-selective atomic layer deposition (AS-ALD) using small molecule inhibitors (SMIs) holds promise for thin-film patterning but suffers from selectivity loss

Computational investigations of area-selective #ALDep require realistic & suitable chemical models - authors from @unileipzig.bsky.social show the impact of this choice for AS-ALD modelling using SMIs on silica.

doi.org/10.1116/6.00...

There! Now Web of Science also knows our new review, doi.org/10.1021/acs.... #ALDep on particles.

I like to see the note of associated data at the left - yes this has quite some associated data (open research software), see: zenodo.org/records/1796....

ALAM-printed lines consisting of indium(III) sulfide characterized as thickness maps and thickness profiles by imaging ellipsometry

#Atomic-layer #additive #manufacturing (ALAM / DALP) of #semiconductors -- a demo by Yara, Syrine, Sonja & Micah w/ colleagues Latifa Bergaoui & Erdmann Spiecker (+group) published in #Chemistry #Africa!

#ChemPrint #CorMic #ChemSky #MaterialsSky #materials #ALDep

link.springer.com/article/10.1...

Prediction of atomic layer deposition chemistry of Ru onto TaN for interconnect stack using the RuO4 precursor Interconnects are crucial for the operation of electronic devices and consist of a diffusion barrier, liner layer, and the metal copper. However, this trilayer

Authors from @tyndallinstitute.bsky.social use theoretical modeling to predict #ALDep chemistry of Ru on TaN using a RuO₄ precursor — an area of growing importance for advanced interconnect stacks.

doi.org/10.1116/6.00...

Atomic Layer Deposition on Particulate Materials from 1988 through 2023: A Quantitative Review of Technologies, Materials, and Applications Atomic layer deposition (ALD) is widely studied for numerous applications and is commercially employed in the semiconductor industry, where planar substrates are the norm. However, the inherent ALD feature of coating virtually any surface geometry with atomistic thickness control is equally attractive for coating particulate materials (supports). In this review, we provide a comprehensive overview of the developments in this decades-old field of ALD on particulate materials, drawing on a bottom-up and quantitative analysis of 799 articles from this field. The obtained dataset is the basis for abstractions regarding reactor types (specifically for particles), coating materials, reactants, supports and processing conditions. Furthermore, the dataset enables direct access to specific processing conditions (for a given material, surface functionality, application etc.) and increases accessibility of the respective literature. We also review fundamental concepts of ALD on particles and discuss the most common applications, i.e., catalysis (thermo-, electro-, photo-), batteries, luminescent phosphors and healthcare. Finally, we identify historical trends and provide an outlook on prospective developments.

Interested in #ALDep on particles? Read our paper in Chem. Mater. 2026, 38, 1, 20–86. Open access, so everyone can read it!

pubs.acs.org/doi/10.1021/...

The full dataset is reposited on Zenodo (zenodo.org/records/1796...) & analysis scripts can be forked on GitHub (github.com/P4Science/AL...).

📢Call for #ALDALE2026 abstracts -due February 5. Join us in 🌴Tampa, FL for the AVS 26th International Conference on Atomic Layer Deposition & the 13th Atomic Layer Etching Workshop. #ALDep #ALEtch ald2026.avs.org

Atomic Layer Deposition on Particulate Materials from 1988 through 2023: A Quantitative Review of Technologies, Materials, and Applications Atomic layer deposition (ALD) is widely studied for numerous applications and is commercially employed in the semiconductor industry, where planar substrates are the norm. However, the inherent ALD feature of coating virtually any surface geometry with atomistic thickness control is equally attractive for coating particulate materials (supports). In this review, we provide a comprehensive overview of the developments in this decades-old field of ALD on particulate materials, drawing on a bottom-up and quantitative analysis of 799 articles from this field. The obtained dataset is the basis for abstractions regarding reactor types (specifically for particles), coating materials, reactants, supports and processing conditions. Furthermore, the dataset enables direct access to specific processing conditions (for a given material, surface functionality, application etc.) and increases accessibility of the respective literature. We also review fundamental concepts of ALD on particles and discuss the most common applications, i.e., catalysis (thermo-, electro-, photo-), batteries, luminescent phosphors and healthcare. Finally, we identify historical trends and provide an outlook on prospective developments.

...Now there! doi.org/10.1021/acs....
(apparently, it was there on Dec 22 already)

Review on #ALDep on particles, covering a database (in Zotero, openly available) of ~800 scientific articles on the topic. History of catalysis ALD detailed as in no review article before. TU Delft collaboration.

I’ll be speaking at the Thin Film Society webinar on Dec 17!
“Atomic Layer Innovations: New Pathways for Future Semiconductor Fabrication”
• #ASDep for future patterning
• AI-driven materials design via #ALDep
🕘 9 PM Seoul / 1 PM CET / 7 AM EST
🔗 voovmeeting.com/dm/xrmEzmbmY...

Dual-purpose alumina ALD coatings for enhanced oxidation resistance and thermal conductivity of boron nitride nanotube fabrics Boron nitride remains a critical material for myriad applications requiring high-temperature stability and thermal management. This work explores the utilizatio

Authors from the U.S. Naval Research Laboratory & Purdue University utilize #ALDep of Al₂O₃ on BNNT fabrics to enhance their high-temperature stability limit, a method that could potentially to do the same for other nanoporous materials.
doi.org/10.1116/6.00...

Work function tuning in TiAlN thin films by trace Al doping for CMOS-compatible metal gates With continued scaling of semiconductor devices, integrating high-k dielectrics with metal-gate electrodes is essential to overcome the limitations of conventio

Low-temp #ALDep supercycles insert trace Al into TiN, forming TiAlN with a tunable effective work function while keeping conductivity—enabling a dual-compatible metal-gate electrode for both n-type & p-type MOSFETs.
doi.org/10.1116/6.00...

Outside front cover: Solution ALD of (CH3NH3)(PbI3) Perovskite Thin Films Yields Functional Quality and Stability Superior to Classical Processing Atomic layer deposition builds up solids in individual atomic steps by a cyclic repetition of successive surface reactions. In the Communication (e13903) by Julien Bachmann and co-workers this approa...

Our #ChemPrint paper on solution #ALDep (sALD) of a halide #perovskite w stability & carrier lifetimes improved wrt state-of-the-art #processing is on the cover of @angewandtechemie.bsky.social!
Check out the pivalates hovering over the #surface to deliver Pb ions.

#ChemSky
doi.org/10.1002/anie...

Direct atomic layer processing breaks #ALDep free from vacuum limits!

It prints ALD-quality TiO₂ layers at ambient pressure with no overspray, ultra-smooth films, & at speeds up to 200 mm/s—high-throughput, precision nanofab made easy.

doi.org/10.1116/6.00...

Photograph of Mahtab Mortazavi

The @ctfm-lab.bsky.social lab at @fau.de welcome our newest doctoral candidate Mahtab Mortazavi, who joins the #ChemPrint team to investigate the #surface #chemistry of solution #ALDep! We look forward to seeing your exciting #research #results!

#PhDlife #chemsky #materialssky

tinyurl.com/35p87kty

Maksym Plakhotnyuk, Atlant 3D CEO, Julien Bachmann, prof at FAU CTFM and Atlant 3D co-founder, and Micah Mc Naire, PhD student at FAU CTFM

The participants of the Atomhagen 2025 workshop on atomic-level processing

Micah wowed the crowd at the Atomhagen workshop on atomic-level #processing organized by Atlant 3D Nanosystems in Copenhagen, presenting his MSc thesis, an atomic-layer #additive #manufacturing procedure for miniaturized #solar cells!

#ALDep #3Dprinting

tinyurl.com/47nkju44
tinyurl.com/4tkz6eyb

📢Attention #ALDep and #ALEtch researchers - #ALDALE2026 is now accepting abstracts through February 5. Join us in 🌴Tampa, FL for the AVS 26th International Conference on Atomic Layer Deposition & the 13th Atomic Layer Etching Workshop. #AtomicLayerDeposition #AtomicLayerEtching ald2026.avs.org

Our new paper in Applied Surface Science explores #ASDep of W and Ru using a Homometallic Precursor Inhibitor approach.
Yes—we actively look for bad #ALDep precursors as inhibitors!
Free to read/download until Jan 4th. authors.elsevier.com/a/1m6NhcXa-C...

Images and text of the newest members of Wayne State University’s Academy of Scholars

Congratulations to the five faculty members who were inducted this week into @waynestateclas.bsky.social’s Academy of Scholars including #wsuchemistry’s Chuck Winter! #chemistryindetroit #AlDep

Solution ALD of (CH3NH3)(PbI3) Perovskite Thin Films Yields Functional Quality and Stability Superior to Classical Processing Chemically controlled deposition of the prototypical hybrid halide perovskite methylammonium triiodoplumbate(II), MAPI, is demonstrated in layer by layer fashion from the solution phase. Theoretical ....

Just published in @angewandtechemie.bsky.social:
Beautiful #ChemPrint collaboration btw. 8 @fau.de groups (@guldi-group.bsky.social & more) to establish 'solution #ALDep' (sALD) of halide #perovskites!
We observe nucleation & growth #in-situ & demonstrate superior quality!

doi.org/10.1002/anie...

Regression analysis of temperature-dependent alumina atomic layer deposition growth per cycle using trimethylaluminum and water as precursors Temperature-dependent alumina atomic layer deposition (ALD) growth per cycle ( G P C) data were collected from studies of the trimethylaluminum (TMA)/water ALD

In #ALDep, temp vs. growth per cycle (GPC) is often viewed as a piecewise-continuous function, GPC varying with increasing temp. This study from @univofmaryland.bsky.social explores if alumina ALD based on TMA & water follow the same trends proposed in previous literature. doi.org/10.1116/6.00...

Artificial intelligence in atomic layer deposition Atomic layer deposition (ALD) is a vapor-phase thin-film deposition technique offering precise atomic-scale control over film thickness and conformality. Widely

AI & ML improve #ALDep by optimizing processes, predicting film quality, assisting precursor discovery, & integrating physics-informed models for reliable thin-film design.

doi.org/10.1116/6.00...

On the impact of atomic layer deposition processing on the chemical and opto-electrical properties of NiO thin films Nickel oxide (NiO) is a promising p-type semiconductor extensively investigated for applications in photovoltaics, electrochemical energy storage, and gas senso

Three #ALDep processes for NiO films developed at @tue.nl offer tunable stoichiometry and optoelectrical properties for energy and sensor applications. doi.org/10.1116/6.00...

Graduation cake

#PhDfinished! Congratulations to Dr. Thomas Rose-Gray who successfully defended his dissertation: “Atomic Layer Deposition of Copper and Silver Thin Films” at #wsuchemistry. #PhDdone #AlDep #chemistryindetroit

Never happened before Yesterday at the EFDS #ALDep 4 Industry committee call both me and @seanbarry.bsky.social run out of jokes and had to leave the call 5 min early. We left the Germans and the Dutch all alone in the call ha ha. How will this play down in Eindhoven @harmknoops.bsky.social !?

Benzimidazolium hydrogen carbonate salts—Investigation of thermal properties in the context of small molecule inhibitors The thermal properties of N-heterocyclic carbenes (NHCs) are of interest as these species are attracting attention for use as small molecule inhibitors (SMIs) i

Thermal analysis of 19 NHCs shows how steric bulk affects volatility & activation temps—key for area-selective #ALDep. Authors from @carleton.ca & @c2mci.bsky.social show that NHCs have strong potential as stable, tunable vapor-phase small molecule inhibitors. doi.org/10.1116/6.00...