AVS e-Talks 2026 It's Time for 2026 e-Talks: Hosted by the AVS Thin Films Division All AVS e-Talks are geared toward a general technical audience, including academic and industrial researchers, technologists, policy-m...

FREE e-Talks by the AVS Thin Film Division: avs.swoogo.com/avsetalks2026 4/28, Ekta Bhatia, NY Creates, Enabling Scalable Superconducting Quantum Devices with 300 mm Wafer Processes & 5/13, Russ Renzas, Univ of Nevada Reno, ALE for Better Quantum Device Performance #ALEtch #QuantumDevices #ThinFilm

The #ALDALE2026 schedule 🚀 has launched & there are some 🔥talks – checkout the plenary, invited, innovator, oral, and poster talks + the awards finalists, sponsors, & exhibitors. Want to present it’s not too late - submit by ⏳ April 9. Early registration ends May 1.
ald2026.avs.org #ALDep #ALEtch

Directional atomic layer etching of MgO-doped lithium niobate using Br-based plasma Lithium niobate ( LiNbO 3, LN) is a nonlinear optical material of high interest for integrated photonics with applications ranging from optical communications t

#ALEtch is a promising technique for the nanofabrication of thin-film lithium niobate, used in nanophotonics.

Authors from @caltech.edu & @unevadareno.bsky.social report an atomically precise etch process which could enable unprecedented device performance.

doi.org/10.1116/6.00...

Diffusion-reaction modeling of atomic layer etching We present a diffusion-reaction model of plasma-assisted atomic layer etching (ALE) of silicon (Si) with alternating exposure to chlorine gas ( Cl 2) and argon

From @princeton.edu & TEL Technology Center, Americas, authors develop a diffusion–reaction model of spatial & temporal evolution of reactive species during plasma-assisted #ALEtch. It links diffusion, reaction kinetics, & ion-driven effects in a physically meaningful way.
doi.org/10.1116/6.00...

Thermal atomic layer etching of SnO2 by fluorination and ligand-exchange/conversion reactions using sequential hydrogen fluoride and Al(CH3)3 exposures Thermal atomic layer etching (ALE) of SnO2 was performed using a sequence of self-limiting fluorination and subsequent ligand-exchange/conversion reactions. The

From @colorado.edu & SEMES, authors use thermal #ALEtch on SnO₂ with sequential self-limiting ligand-exchange/conversion & fluorination reactions. Self-limiting surface chemistry enables controlled, atomic-scale removal of SnO₂ with purely thermal processes.

doi.org/10.1116/6.00...

📢Call for #ALDALE2026 abstracts -due February 5. Join us in 🌴Tampa, FL for the AVS 26th International Conference on Atomic Layer Deposition & the 13th Atomic Layer Etching Workshop. #ALDep #ALEtch ald2026.avs.org

Atomic layer etching of molybdenum with O2 and NbCl5 Molybdenum is a material of significant interest in the development of future interconnects for microelectronics. This is due to a slower increase in resistivit

Authors from @helsinki.fi describe a self-limiting #ALEtch process for etching molybdenum using O₂ + NbCl₅ - offering isotropic & selective etching with high control. Promising for the future development of interconnects for microelectronics!
doi.org/10.1116/6.00...

📢Attention #ALDep and #ALEtch researchers - #ALDALE2026 is now accepting abstracts through February 5. Join us in 🌴Tampa, FL for the AVS 26th International Conference on Atomic Layer Deposition & the 13th Atomic Layer Etching Workshop. #AtomicLayerDeposition #AtomicLayerEtching ald2026.avs.org

Valhalla has arrived from across the pond - stay tuned for more information. Ymir is ready to open the first gate valve to fully automated 300 mm APS(TM) processing for our customers. #AlixLabs #Sweden #Semiconductor #ALEtch

Atomic layer etching of niobium nitride using sequential exposures of O2 and H2/SF6 plasmas Niobium nitride (NbN) is a metallic superconductor that is widely used for superconducting electronics due to its high transition temperature ( T c) and kinetic

Niobium nitride is important for superconducting electronics. Researchers from @caltech.edu and @ucberkeleyofficial.bsky.social developed an #ALEtch process with low damage and sub-nm etching precision, which may enhance quantum device performance. doi.org/10.1116/6.00...

Warwick Atomic Layer Processing (WALP) 2025

Attending the WALP workshop on #ALDep & #ALEtch- very interesting & cozy event, my talk on #ALDconformality soon. warwick.ac.uk/fac/sci/chem...

Student approached to thank for the #JAP2005 #TMAwater review, which has helped him into ALD field. This happens occasionally & always makes my day!

AlixLabs proudly hosted a special plaque ceremony in Tokyo to celebrate Dr. Seiichi Iwamatsu, inventor of Atomic Layer Etching (ALE). Developed in 1981, #ALEtch remains vital to semiconductor scaling today – powering logic, memory, and power electronics.
#Tokyo #Japan

Let's play Atomic Tetris! #ALDep #ALEtch #tetris

The ALE 2025 Plenary Speaker will be Chanmin Lee from Samsung speaking on Challenges and Future of ALE Technology in Semiconductor Manufacturing." Check out the complete program this June on Jeju Island, South Korea ald2025.avs.org #ALEtch

Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) - AIP Publishing LLC

#JVSTA is a leader in #ALDep & #ALEtch. Each year, we publish collections in conjunction with the annual ALD/ALE meeting & this year's collections are now open for submissions! @avs-members.bsky.social
Submit by November 1, 2025.
tinyurl.com/4swne95y

I bet Bluesky can come up with a equally good Meme as Twitter? #ALDep #ALEtch

🎤 AlixLabs on Stage at the SOLD OUT 2025 CMC Conference!
🕓 4:00 PM | March 29 | Bergström Ballroom
👨‍🔬 Dr. Robin Athle, Principal Engineer
"Atomic Layer Etching Pitch Splitting (APS): A New Alternative to Multi Patterning"
#ALEtch #Semiconductors #Lithography #Texas #USA #Austin

Greetings from Leipzig and #ASD2025 #ALDep #ALEtch #ASDep

Join us for #ALDALD2025 this June on Jeju Island, South Korea! Check out all the NEW RESEARCH in the Technical Program at ald2025.avs.org. Late News Poster Abstracts Deadline: April 2 | Early Registration Deadline: May 1. #ALDep #ALEtch conta.cc/4gtgyey

Plasma atomic layer etching of tantalum nitride with surface fluorination and Ar ion sputtering A comparative study on the atomic layer etching (ALE) process window was conducted for tantalum nitride (TaN) using nitrogen trifluoride (NF3) and carbon tetraf

A precise #plasma #ALEtch process was developed by researchers at Sungkyunkwan Univ. for tantalum nitride using NF3 and CF4. The method provides atomic-level control, reduces etching residues, & achieves smoother surfaces compared to reactive ion etching. doi.org/10.1116/6.00...

AlixLabs to Showcase Latest APS™ Findings at SPIE Advanced Lithography + Patterning
Swedish semiconductor startup to demonstrate 3-nanometer class FinFET structures made with APS™ on Intel Silicon at trade show. @alixlabs.bsky.social #ALEtch #Semiconductor
www.alixlabs.com/2025/02/07/a...

Coming 2025 - APS(TM) 300mm Platform. AlixLabs Introduces 300mm APS™ to Enable Small Nodes at Low Cost. #semiconductor @alixlabs.bsky.social #TeamSweden #Sweden #APSTM #ALEtch

The #ALDep #ALEtch song by Linkin Park: @drhenke.bsky.social

The cycle repeated
As explosions broke in the sky
All that I needed
[...]
We're building it up to break it back down
We're building it up to burn it down
We can't wait to burn it to the ground
youtu.be/dxytyRy-O1k?...

ALD/ALE 2025 Submission # 10785 by
@alixlabs.bsky.social
We will be showing off the smallest high aspect ratio fin that we´ve done, 19 atoms across. Amongst other things!
Abstract submission closes Thursday, February 6, 2025 4:59 AM UTC. #Korea #ALDep #ALEtch #Semiconductor #ALDALE2025

Home

The time has come to submit your #ALDALE2025 abstracts. Due tomorrow February 5 ald2025.avs.org @AvsAld #ALDep #ALEtch

Ymir blue plasma #aletch

Ladies and gentlemen, this is how you play the catch 2019 start a 300 mm ALE Equipment company. Then invest in atomic level process wafer metrology wafer company. 2025 Just when the first 300 mm ALE chamber is operating, the first 300 mm ALE test wafer arrive. #Kippis #aletch #aldep

Calling all researchers! Submit your abstracts for #ALDALE2025 by Feb 5! #ALDep #ALEtch ald2025.avs.org
conta.cc/4jE0yIQ

Atomic layer etching pitch splitting (APS): a new alternative to self-aligned double patterning | SPIE Advanced Lithography + Patterning View presentations details for Atomic layer etching pitch splitting (APS): a new alternative to self-aligned double patterning at SPIE Advanced Lithography + Patterning

Guess what - our abstract on APS(TM) is accepted for oral presentation at SPIE 2025 Lithography + Patterning in San Jose California February 27 - Silicon Valley here we come! ✅ spie.org/advanced-lit...
#APSTM #AlixLabs #ALEtch #Semiconductor #Lithography