Area Selective Deposition - AIP Publishing LLC

As #ASD2026 wraps up today in Albany, don't forget to send #JVSTA your best research on all things area selective deposition!

Submissions to our special collection are open until August 24, 2026 ➡️ publishing.aip.org/publications...

We hope everyone had a great time in Albany. See you next year!

Two-dimensional vanadium compounds inspiring emerging smart applications Owing to the rich structural chemistry and unique electrochemical properties, vanadium-based materials especially the two-dimensional (2D) and layered ones are

It's your lucky day!🍀🌈

Check out this St. Paddy's Day publication reviewing 2D vanadium-based materials for energy storage, electronics, and smart devices. This is the latest article in the #JVSTA collection on #2Dmaterials.

doi.org/10.1116/6.00...

Recently highlighted, this article is now featured on our latest cover of #JVSTA!

Next time you publish with us, submit an eye-catching image for the cover. We would love to feature your research, too!

Read this featured article here: doi.org/10.1116/6.00...

Diffusivity and adlayer formation of C60 on oxygen decorated moiré patterned graphene on Ru(0001) The dynamic mobility and placement of buckminsterfullerene (C60) molecules on moiré-patterned graphene as oxygen atoms are adsorbed across the interface are ill

Featured on the latest #JVSTA cover, graduate student Joshua Wagner and Professor Steven Sibener investigate how atomic oxygen affects the behavior of C₆₀ molecules on 2D materials. Check out their cover-worthy work today - shorturl.at/F2Uuv
#Nanotechnology #Graphene #Physics #QuantumTech

Featured on the latest #JVSTA cover, Joshua Wagner & Steven J. Sibener from the University of Chicago investigate how atomic oxygen affects the behavior of C₆₀ molecules on 2D materials.

Read the featured article here! doi.org/10.1116/6.00...

Abstract Submission

This work is being presented at #AVS71 - and you can still submit your abstract until August 18th! Authors presenting at AVS71 are invited to submit to #JVSTA or #JVSTB.

Submit your abstract today!
avs71.avs.org/abstract-sub...

Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) - AIP Publishing LLC

#JVSTA is a leader in #ALDep & #ALEtch. Each year, we publish collections in conjunction with the annual ALD/ALE meeting & this year's collections are now open for submissions! @avs-members.bsky.social
Submit by November 1, 2025.
tinyurl.com/4swne95y

Read Recent Collection Honoring John Ekerdt’s Contributions to Chemical Reaction Engineering and Surface Chemistry for Electronic Materials Email from AVS   Read Recent Collection Honoring John Ekerdt’s Contributions to Chemical Reaction Engineering and Surface Chemistry for Electronic Materials Read the Full Collection for FREE for a Lim

A long-time contributor to #JVSTA & #JVSTB, this collection celebrates the important contributions of John Ekerdt to the area of surface & reaction chemistry of electronic & optoelectronic materials. Read the entire collection FREE for a limited time!
tinyurl.com/mpe77skk

Area Selective Deposition - AIP Publishing LLC

Did you attend #ASD2025 in Leipzig, Germany? Submit your research on area selective deposition to #JVSTA! Our collection includes papers presented at ASD2025 & is open to others on the topic as well. Deadline: July 7, 2026! @avs-members.bsky.social
tinyurl.com/42e7w4ew

Promoting seed germination is crucial for increasing grain production to support an increasing world population. Featured on a recent #JVSTA cover, this article studies effects of gliding arc discharge plasma treatment on the germination of wheat seeds. doi.org/10.1116/6.00...

Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy Thin film deposition is a fundamental technology for the discovery, optimization, and manufacturing of functional materials. Deposition by molecular beam epitax

Authors from PNNL, Auburn, and @udelaware.bsky.social developed a #MachineLearning framework for analyzing reflection high energy electron diffraction (RHEED) pattern images in real time, enabling autonomous feedback control of #thinfilm deposition. #JVSTA
doi.org/10.1116/6.00...

Trap states and hydrogenation of implanted Si in semi-insulating Ga2O3(Fe) The electrical properties and deep trap spectra of semi-insulating Ga2O3(Fe) implanted with Si ions and subsequently annealed at 1000 °C were investigated. A si

β-Ga₂O₃ is a wide-bandgap #semiconductor of great interest for use in high-power electronic devices & UV photodetectors. This #JVSTA study explores how hydrogen #plasma treatment affects the electrical properties of Si-implanted β-Ga₂O₃(Fe). @avs-members.bsky.social
doi.org/10.1116/6.00...

Recent trends in thermal atomic layer deposition chemistry In this review, we highlight new atomic layer deposition (ALD) precursors and process chemistries based on the ALD database found in atomiclimits.com. The aim w

Precursor chemistry plays a key role in the success of thermal #ALDep in an ever-broadening range of applications, shown in this comprehensive review of materials & precursors published since 2010, from researchers at @helsinki.fi.
#JVSTA @avs-members.bsky.social
doi.org/10.1116/6.00...

Tracing degradation mechanisms of epitaxially grown GaAsSb on InP by InSb formation at elevated temperatures The thermal stability of GaAsSb/InP is known to be compromised by group-V volatility and intermixing at the heterojunction that adversely impact the performance

The GaAsxSb1−x alloy is an attractive material system for infrared #photodetectors and #lasers. In this #JVSTA study, researchers from @unm.edu and @upenn.edu explore the GaAsSb/InP interface & trace its degradation during extended annealing. @avs-members.bsky.social
doi.org/10.1116/6.00...

The case for denoising/smoothing X-ray photoelectron spectroscopy data by Fourier analysis Traditionally, the smoothing of X-ray photoelectron spectroscopy (XPS) data has been avoided. Data smoothing should not be viewed as a means of “fixing” poorly

Traditionally, the smoothing of #XPS data has been avoided, but here the authors present a case for denoising XPS spectra under appropriate circumstances & with good algorithms.

doi.org/10.1116/6.00...

In the #JVSTA collection on Reproducibility Challenges & Solutions: tinyurl.com/4vwj9mtw

Improvement of data analytics techniques in reflection high-energy electron diffraction to enable machine learning Perovskite oxides such as LaFeO 3 are a well-studied family of materials that possess a wide range of useful and novel properties. Successfully synthesizing per

In this #JVSTA study, authors from Auburn University, ORNL, and @udelaware.bsky.social discuss a new algorithm for RHEED image alignment that will help optimize the use of unsupervised #machinelearning to analyze film growth during MBE. @rbcomes.bsky.social
doi.org/10.1116/6.00...

SiO2 atomic-layer fluorination-passivation for dual-material molybdenum/polypyrrole area-selective deposition and strategies for surface reactivation Recent research on area-selective deposition (ASD) has begun to expand beyond ASD of one material on two different surfaces (i.e., a two-color substrate) to exp

This #JVSTA study introduces molybdenum metal and polypyrrole dual-material area selective deposition. Researchers from @NCState observed self-aligned, colocalized material growth. @avs-members.bsky.social
doi.org/10.1116/6.00...

Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures This work presents the development and implementation of a low-temperature atomic layer deposition (ALD) process for metallic cobalt thin films. The works are b

Cobalt #thinfilms can be used in chip interconnects, magnetic sensors, and antibacterial coatings. Researchers from Germany have developed a novel #ALDep process for metallic cobalt at ultra-low temperatures. #JVSTA @avs-members.bsky.social doi.org/10.1116/6.00...

Investigation of ruthenium etching induced by electron beam irradiation and O2/Cl2 remote plasma-based neutral fluxes: Mechanistic insights and etching model Ruthenium (Ru) films have recently received attention in the microelectronics industry due to their unique physical and chemical properties. In this work, we in

Researchers from @univofmaryland.bsky.social & @zeissgroup.bsky.social developed a process for highly controlled Ru etching using radical fluxes from an O2/Cl2 remote plasma & electron beam irradiation, and a model that reproduces the observed behavior. #JVSTA doi.org/10.1116/6.00...

Effect of scanning speed on the organization and properties of CoCrFeNi fusion cladding layer The effects of the scanning speed on the organization, hardness, and corrosion properties of laser-melted CoCrFeNi-fused cladding layers were investigated. In t

For longer-lasting, #corrosion resistant materials for industrial applications, this #JVSTA study shows effects of scanning speed on the organization, hardness, & corrosion properties of a CoCrFeNi #HighEntropyAlloy cladding layer on CX stainless steel.
doi.org/10.1116/6.00...

Spatial atomic layer deposition: Transport-reaction modeling and experimental validation of film geometry Spatial atomic layer deposition (SALD) is a powerful thin-film deposition technique to control surfaces and interfaces at the nanoscale. To further develop SALD

In this #JVSTA paper, the authors develop a digital-twin model of their SALD system integrating fluid flow + surface chemistry, providing insights into the film geometry. #ALDep @avs-members.bsky.social

doi.org/10.1116/6.00...

Revisiting the assignment of atomic charges in metal oxides based on core-level x-ray photoelectron spectra: The case of Ti in SrTiO3(001) We demonstrate that assigning formal charges to transition metal (TM) cations based on core-level (CL) x-ray photoemission binding energies in oxides leads to p

#XPS is considered a go-to technique for determining charges on atoms in complex #materials. In this #JVSTA paper, researchers from PNNL & UNT expose & address a prevailing misconception on how to accurately assign those charges. @avs-members.bsky.social
doi.org/10.1116/6.00...

Nonpyrophoric alternative to trimethylaluminum for the atomic layer deposition of Al2O3 We have examined the atomic layer deposition (ALD) of Al2O3 using a nonpyrophoric precursor, which possesses only Al–N bonds and no Al–C bonds: Al(N(CH3)2)2(–N(

Researchers from Cornell present results on #ALDep of Al2O3 using a non-pyrophoric precursor that produces thin films with properties comparable to those found with trimethylaluminum, and exhibiting a similar temperature window. #JVSTA @avs-members.bsky.social
doi.org/10.1116/6.00...

Congratulations to David Morgan, named #JVSTA Most Valuable Reviewer for 2024! David completed a number of high-quality reviews for JVST A last year, in addition to publishing his impactful work in @avs-members.bsky.social journals. Thank you, David!
#peerreview

tinyurl.com/25vxvefw

Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration Tungsten diselenide, WSe2, is attractive as a channel material for p-channel metal–oxide–semiconductor field effect transistors (PMOSFETs) using transition meta

Researchers from @utaustin.bsky.social, Samsung Electronics, & Birla Institute of Technology Mesra are optimizing CVD growth & fabrication techniques to enhance hole conduction in WSe₂ — a promising material for next-gen CMOS technology. #JVSTA @avs-members.bsky.social doi.org/10.1116/6.00...

Preparation of stable and highly hydrophobic coatings via one-step spray method and study of their anti-icing performance In daily life, phenomena such as icing, corrosion, and dust accumulation on metal surfaces significantly reduce the operational efficiency of working systems. R

Phenomena such as icing, corrosion, & dust accumulation on metal surfaces greatly reduce the efficiency of working systems. In this #JVSTA study, researchers developed a durable, #superhydrophobic coating using a one-step spray method. @avs-members.bsky.social doi.org/10.1116/6.00...

Remote plasma assisted processing and semiconductor interface electronic structure The development of remote plasma-assisted treatment of semiconductors has helped to drive microelectronics into the nanoscale regime. Dr. Gerry Lucovsky’s pivot

Gerry Lucovsky’s remote plasma-assisted #semiconductor treatments combined with depth-resolved cathodoluminescence spectroscopy have expanded the understanding and control of semiconductor interfaces. #JVSTA @avs-members.bsky.social
doi.org/10.1116/6.00...

Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions Machine learning approaches to potential generation for molecular dynamics (MD) simulations of low-temperature plasma-surface interactions could greatly extend

This work by researchers at Princeton University & PPPL demonstrates that a specific #machinelearning approach, Deep Potential Molecular Dynamics, can generate potentials that provide a good model of #plasma etching in the Si-Cl-Ar system. #JVSTA @avs-members.bsky.social doi.org/10.1116/6.00...

Modeling scale-up of particle coating by atomic layer deposition Atomic layer deposition (ALD) is a promising technique to functionalize particle surfaces for energy applications including energy storage, catalysis, and decar

As interest in #ALDep manufacturing increases, researchers from Argonne National Laboratory are exploring ways to scale-up the process of ALD particle coating. #JVSTA @avs-members.bsky.social doi.org/10.1116/6.00...

Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. II. Experiments and model validation A simulation model for selective molecular gas etching in nanostructures has been described in Paper I [Z. Zajo et al. J. Vac. Sci. Technol. A 43, 013006 (2025)

Validation of the simulation by looking at the selective thermal F2 etching of SiGe over Si in stacked nanostructures also reveals how to achieve high aspect-ratio stacked structures with uniform etch rates across all layers. @avs-members.bsky.social #JVSTA doi.org/10.1116/6.00...